Pure and Applied Chemistry, 1985, Volume 57, No. 9, pp. 1311-1320

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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1311-1320

doi:10.1351/pac198557091311

On the plasmaphysics of plasma-etching

T. J. Bisschops and F. J. de Hoog

Conference

Seventh International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, 1–5 July 1985

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